
-
独一无二的维护创新,模块化设计与超高效率燃烧器的完美结合Burn WetGAIA-I SINGLE
- Total Capacity
- 1,000 slm
- Target Gas
- PFCs (> 99%), HFCs, etc.
- Target Process
- DIFF, CVD, Etch, Metal, etc.
- Dimension
- 1000X780X1874
-
碳中和的新标杆,下一代电气等离子体气体净化技术Plasma WetGAIA-P SINGLE
- Total Capacity
- 1,000 slm
- Target Gas
- PFCs (> 99%), HFCs, etc.
- Target Process
- DIFF, CVD, Etch, Metal, etc.
- Dimension
- 950X1000X1842
-
下一代低碳净化技术创新平台Heat-Catalyst WetMiTHAs I
- Total Capacity
- 1,000 slm
- Target Gas
- PFCs (> 99%), HFCs, etc.
- Target Process
- Etch
- Dimension
- 900X1100X1950
-
泵一体化设计,创新节省安装成本Integrated Vacuum and Abatement SystemiVAS
- Total Capacity
- 1,000 slm * 2 EA
- Target Gas
- PFCs (> 99%), HFCs, etc.
- Target Process
- DIFF, CVD, Etch, Metal, etc.
- Dimension
- 3720X1268X1811
-
终极超大容量处理, 6000CMH的超凡净化解决方案WetGAIA GARAM
- Total Capacity
- 6,000 CMH
- Target Gas
- RCA Cleaning gas (> 95%)
- Target Process
- Wet cleaning
- Dimension
- 2400X1500X2350
-
以吸收与催化技术构建的低碳环保平台WetSOOPIA-C
- Total Capacity
- 1,000 slm
- Target Gas
- H₂<5% (>99%)
- Target Process
- some processes of Metal etch
- Dimension
- 1600X1100X1870
-
融合简约、高效与安全的创新平台DrySDS-500
- Total Capacity
- 250 slm
- Target Gas
- Cl₂ (> 99%), BCl₃
- Target Process
- Metal etch, Implant, etc.
- Dimension
- 650X590X1750
-
以水喷射技术打造的可持续气体处理平台WetSWS-I
- Total Capacity
- 1,000 slm
- Target Gas
- Water soluble gas
- Target Process
- Wet cleaning
- Dimension
- 900X750X1795
-
碳中和新标准:新一代电力等离子体气体净化技术Plasma WetGAIA-P DUAL
- Total Capacity
- 1,000 slm * 2 EA
- Target Gas
- PFCs (> 99%), HFCs, etc.
- Target Process
- DIFF, CVD, Etch, Metal, etc.
- Dimension
- 1900X1000X1842
-
설치 효율성과 에너지 절약을 모두 달성하는 기술 혁신Burn WetGAIA-EV6
- Total Capacity
- 600 slm
- Target Gas
- PFCs (> 99%), HFCs, etc.
- Target Process
- Etch
- Dimension
- 1200X730X1870
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